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Product Code: 6.2030
Neutronco

Topica starch

CAS number 02/07/9057
HS Code 11081400
Storage Storage at 5 to 30 °C
SDS available
Description Conforms
Identification Conforms
Solubility Conforms
pH 4.5 to 7.0
Loss on drying 16.0 %
Residue on ignition 0.6 %
Iron 0.002 %
Limit of oxidizing substances 0.002 %
Limit of sulfur dioxide 0.005 %

Topical Starch is a finely powdered, absorbent carbohydrate derived from natural sources such as corn, rice, or wheat, and it is widely used in pharmaceutical and laboratory formulations due to its soothing, moisture-absorbing, and protective properties.

🏭⚗️ Production
Topical starch is produced by extracting and refining starch from plant sources under controlled conditions to ensure purity suitable for pharmaceutical and laboratory use. The resulting product is a fine, white, odorless powder with excellent dispersibility and moisture-absorbing capacity.

🔬 Properties
Topical starch exhibits high absorbency, mildness to the skin, and chemical inertness. It is non-toxic, non-irritating in recommended concentrations, and forms a protective barrier on the skin to reduce friction and irritation. Its ability to absorb moisture makes it ideal for use in formulations that require drying or protective effects.

🧪 Applications
In pharmaceutical applications, topical starch is used in powders, ointments, and creams to absorb excess moisture, soothe irritated skin, and provide a protective barrier on the surface. It is particularly useful in formulations for diaper rash, minor skin irritations, and friction-prone areas. In laboratory settings, topical starch can be used as an inert filler, stabilizer, or protective agent in experimental formulations and dermatological studies.

⚠️ Safety
Topical starch is generally regarded as safe for pharmaceutical and laboratory use when applied within recommended concentrations. However, inhalation of fine powders should be minimized to prevent respiratory irritation. Proper safety measures, including the use of protective masks and adequate ventilation, should be followed when handling this compound.